Characterization of TiO2 thin films deposited by using dc magnetron sputtering
Nalin Prashant Poddar (*), S. K. Mukherjee
Department of Physics, Birla Institute of Technology, Mesra, Ranchi – 835215, India.
Carbon – Science and Technology 8/2 (2016) 1 – 8.
© Applied Science Innovations Private Limited, India.
Full Text (OPEN ACCESS) : CST-184.pdf
Keywords: TiO2 thin films, dc magnetron sputtering, characterization, optical properties, photocatalyst
Abstract: Titanium dioxide thin films were deposited on silicon (111) and glass substrates by using direct current (dc) magnetron sputtering system. Thin films were deposited with different O2 gas flow rate (1, 3, 9, 12 sccm) while keeping Ar gas flow rate constant at 30 sccm. The samples exhibit amorphous phase as deposited and become polycrystalline at 350ºC. X-ray diffraction (XRD) studies confirmed existence of anatase and rutile phase after post deposition annealing. As deposited films were transparent and their band gap increases with increase in oxygen gas flow rate. Fourier transform infrared (FTIR) spectroscopy data confirmed the existence of Ti-O band present in deposited films.
